SPIET800 | ABB BAILEY | Flexible optoelectronic technology
¥3,355.00
Module Number: SPIET800
Product status: Discontinued
Delivery time: In stock
Sales country: All over the world
Product situation: Brandnew , one year warranty
Contact me: Sauldcsplc@gmail.com +8613822101417 SIMON
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Description
SPIET800 | ABB BAILEY | Flexible optoelectronic technology
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SPIET800 we have:
We provide considerate service and complete parts
① Promptly reply you within 24 hours;
② 100% quality assurance, 1-year warranty;
③ Best services, reasonable price;
④ Have been in the line for many years, has a good reputation;
⑤ We will ship the items within 3 working days after the payment is reached;
⑥ All the goods will be tested before shipment;
⑦ Packing in professional anti-static bag;
American scientists have used nanostencil lithography technology to create large-scale nano patterns on flexible substrates. SPIET800, a high-yield manufacturing technology, only requires one step to produce novel optoelectronic components that can wrap curved objects, and is expected to be applied in fields such as medical imaging and environmental monitoring.
Soft electronics have made significant progress in the past decade, giving rise to many novel applications, such as SPIET800 electronic paper displays, artificial skin, and electronic eye imaging. However, in this regard, optoelectronic technology cannot keep up with the development, especially in the application at the nanoscale. The reason is that general nanofabrication techniques (such as electron beam lithography) cannot be applied on bendable or curved substrates, while soft lithography technology, although able to freely manipulate soft electrons, cannot accurately produce nanoscale components due to resolution limitations.
The research team led by Hatice Altug from Boston University recently utilized nano template lithography, SPIET800, to create nano component patterns on rigid surfaces such as glass, silicon, and calcium fluoride, and the optical response of the resulting components is as good as that of electron beam lithography creators.
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